Electron projection lithography (EPL) is moving out of the R&D lab and into manufacturing evaluation sites, according to chip consortiums International Sematechr and Selete. That’s the word from the ...

CU Boulder researchers have designed microscopic “racetracks” that trap and amplify light with exceptional efficiency. By using smooth curves inspired by highway engineering, they reduced energy loss ...

Home > Press release: Dr. Andreas Erdmann from Fraunhofer IISB ...

Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...

This article presents a method for developing elastic nanoarchitected metamaterials with tunable optical responses.

Researchers in the Harvard John A. Paulson School of Engineering and Applied Sciences (SEAS) and the Faculty of Arts and ...

Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...

Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...

Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...