Rapidus has successfully begun installing ASML's Twinscan NXE:3800E EUV lithography system at its Innovative Integration for Manufacturing (IIM-1) facility in Chitose, Hokkaido, marking a ...
The company demonstrated the full system specification of its Low NA EUV tech (the NXE:3800E) with a throughput of 220 wafers per hour and a new record overlay. ASML also completed the ...
ASML Holding N.V. ASML is slated to report fourth ... In particular, the growing popularity of the NXE:3800 low numerical aperture (NA) machine, which can process 220 wafers per hour, has likely ...