ASML PAS 5500/300C DUV Wafer Stepper Training Video
ASML PAS 5500/300C DUV Wafer Stepper Training Video
Oct 15, 2020
cornell.edu
The reticle and reticle stage - Inside the TWINSCAN NXE:3400 EUV lithography machine | ASML on Make a GIF
The reticle and reticle stage - Inside the TWINSCAN NXE:3400 EUV lith…
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ASML's reticle stage | ASML | 51 comments
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ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
ieee.org
What’s the reticle in a lithography system? Find out in this clip. Check out all our EUV systems, and the technology behind them: http://ms.spr.ly/6182wLVGO | ASML
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2.6K views · 184 reactions | 【Did You Know? EUV光罩承接平台的超級G力】 你記得坐在超刺激的雲霄飛車高速俯衝下的快感嗎？那個力道大約在4G到5G間 我們下一代EUV機台的光罩承接平台(Reticle Stage)將以超過20G的速度加速，卻不引起系統振動 #ASML #EUV #DidYouKnow #BePartOfProgress | ASML | Facebook
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【ASML EUV微影設備｜雙晶圓平台處理技術⚙️】 ASML TWINSCAN曝光機中的晶圓平台（Wafer Stage）是微影設備中關鍵的定位模組（Positioning Module），在系統設計上整合機械電子學、光學設計及量測學（包含量測、數據處理及控制）。雙晶圓平台能在同一時間移動兩片矽晶圓：其中右邊的晶圓曝光於EUV極紫外光下，將電路設計圖影像（Pattern）刻在晶圓上；左邊的晶圓同時由機台的量測儀器優化其準確度（Alignment）。兩個平台交替執行微影和量測功能，並以電磁的方式移動，在無摩擦力的作用下能加速至7G❗️ 這就是ASML的微影系統如何在晶片量產時得以兼顧準確性及生產速度的關鍵。⚡️ #ASML #EUV #WaferStage | ASML
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